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Intel, Samsung, Toshiba aim to halve semiconductor line widths
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The following comments relate to this news article:

Intel, Samsung, Toshiba aim to halve semiconductor line widths

article published on 29 October, 2010

Intel Corp., Samsung Electronics Co Ltd and Toshiba Corp are to form a working group to develop the next generation of chip technology by 2016, according to the Nikkei daily. The three will invite other players in the industry in a bid to develop chip manufacturing technologies that can more than halve the semiconductor line widths to nearly 10 nanometers by 2016. A nanometer is unit ... [ read the full article ]

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29. October 2010 @ 20:42 _ Link to this message    Send private message to this user   
We're barely getting into 32-nm. It's amazing how smaller these chips are getting each year. Wonder what's next after they hit the 10nm mark.
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29. October 2010 @ 22:11 _ Link to this message    Send private message to this user   
Originally posted by mike.m:
We're barely getting into 32-nm. It's amazing how smaller these chips are getting each year. Wonder what's next after they hit the 10nm mark.
The dreaded day when Silicon transistors can't get any smaller without burning up? :S
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